发明名称 ELECTRON BEAM LITHOGRAPHY APPARATUS
摘要 PURPOSE:To enhance the workability without waiting time after a stage has moved, by mounting a cassette, which has a spring which connects the cassette to one side of the stage and a piezoelectric element that is connected to the other side of the stage, and stops the vibration, on the stage, and performing exposure. CONSTITUTION:On the stage having a shaft 2 which is connected to a pulse motor, is mounted the cassette 4 having the spring 5 on one end and the piezoelectric element 6 on the other end. The cassette holds a material to be exposed 3. With the position being sensed by a laser length measuring device 7, the stage is moved by the shaft 2. Immediately after the movement, the vibration whose phase is opposite to that of the vibration of the cassette is applied to the cassette from the piezoelectric element, and the vibration of the cassette is stopped. Since the vibration can be stopped in a very short time, the waiting time after the movement of the stage becomes zero, and the workability of the electron beam exposure can be enhanced.
申请公布号 JPS577929(A) 申请公布日期 1982.01.16
申请号 JP19800082252 申请日期 1980.06.17
申请人 SANYO ELECTRIC CO 发明人 FUKUDA HISASHI
分类号 H01L21/027;H01J37/34;(IPC1-7):01L21/30 主分类号 H01L21/027
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