发明名称 PATTERN POSITION ALIGNING METHOD
摘要 PURPOSE:To shorten an offset adjusting time, by providing a target center of each target mark in each key pattern on the extended line from each chip center, providing manual alignment marks on scribe lines in the longitudinal direction between elements, and performing offset adjustment. CONSTITUTION:Target centers TC of target marks in key patterns 1 and 2 are aligned with chip centers C. Manual alignment marks 3...3 are provided on scribe lines in the longitudinal direction. When a pair of object lenses are moved to the inside from the target center TC by (l), the right manual alignment marks 3 of each element pattern 5 can be observed on the side of the key pattern 1, and the left manual alignment marks 3 can be observed on the side of the key pattern 2. When a pair of the objective lenses are moved by a size 2l in the lateral direction of each element pattern 5, the manual alignment marks 3...3 can be simultaneously observed sequentially. Thus the offset adjusting time can be shortened.
申请公布号 JPS62193123(A) 申请公布日期 1987.08.25
申请号 JP19860034228 申请日期 1986.02.19
申请人 SANYO ELECTRIC CO LTD 发明人 KANEKO MAMORU
分类号 G03F9/00;H01L21/027;H01L21/30;H01L21/67;H01L21/68 主分类号 G03F9/00
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