发明名称 PATTERN POSITION ALIGNMENT METHOD
摘要 PURPOSE:To shorten an offset adjusting time, by providing a plurality of manual alignment marks at right and left positions, which are separated from the center line of each target mark in each key pattern by an equal distance, and performing the offset adjustment. CONSTITUTION:A pair of same manual alignment marks 3 and 3' are provided in each element pattern or on neighboring scribe lines with an equal distance (a) being provided on the right and left sides from a target center TC. When this relation is satisfied, a pair of objective lenses are moved to the inside from the target center TC by the distance (a). Then, the right manual alignment mark 3' in each element pattern 4 can be observed on the side of a key pattern 1. The left manual alignment mark 3 can be observed on the side of a key pattern 2. Conversely, when the lenses are moved to the outside from the target center by (a), the left alignment mark 3 can be observed on the side of the key pattern 1. The right manual alignment mark 3' can be observed on the side of the key pattern 2. Thus, the offset adjusting time can be shortened.
申请公布号 JPS62193122(A) 申请公布日期 1987.08.25
申请号 JP19860034225 申请日期 1986.02.19
申请人 SANYO ELECTRIC CO LTD 发明人 KANEKO MAMORU
分类号 G03F9/00;H01L21/027;H01L21/30;H01L21/67;H01L21/68 主分类号 G03F9/00
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