发明名称 Electron beam irradiation apparatus
摘要 An electron beam irradiation apparatus which comprises: a base plate of a magnetically permeable material; a movable stage mounted on said base plate; an upper magnetic shield plate having an electron beam passage hole disposed above said stage; a side member of high permeability which magnetically interconnects said base plate and said upper shield plate, and; a magnetic shield cover plate which covers the table surface of said stage.
申请公布号 US4310764(A) 申请公布日期 1982.01.12
申请号 US19800158356 申请日期 1980.06.11
申请人 FUJITSU LIMITED 发明人 IIJIMA, NOBUO
分类号 H01J37/04;G01Q30/02;G01Q30/16;G01Q30/18;H01J37/09;H01L21/027;H01L21/30 主分类号 H01J37/04
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