| 摘要 |
PURPOSE:To enable the correct measurement of a film thickness through the elimination of the influence exercised by a change in temperature, by a method wherein a temperature-sensitive element is placed on a monitoring substrate with a temperature being approximately equal to that of a film, and the temperature of the film is measured directly. CONSTITUTION:A temperature-sensitive element 3, such as thermocouples, thermisters, etc., is previously adhered to an insulating substrate 1, such as ceramic, glass, etc., between electrode films 2a and 2b by vacuum-evaporation, sintering and other means, and an evaporating material 4 is vacuum-evaporated between electrodes 2a and 2b. In case the temperature-sensitive element is vacuum-evaporated to between the electrodes 2a and 2b, and the evaporating material 4 is vacuum-evaporated to between the electrodes 2c and 2d, the vacuum-evaporation takes place by using a mask 6 having a slot 5, which has the same shape and size as those of the vacuum- evaporated part, so that the temperature-sensitive element or the vacuum-evaporating material is prevented from being vacuum-evaporated at a part except their respective vacuum-evaporated part. This permits the measurement of a film thickness with almost no error. |
