发明名称 HIGH DENSITY SILICON NITRIDE OXIDE
摘要 A reaction bonded silicon oxynitride product having a density of 85 to 95% of theoretical density, a degree of density heretofore not attainable by sintering or reaction bonding. Such high densities are attained by nitriding, in an oxygen free atmosphere ultra fine silicon and ultra fine silica in the presence of certain reaction aids. The particle size of the silicon powder must be at least as fine as about 3 microns and the silica as fine as about 0.3 microns.
申请公布号 JPS573771(A) 申请公布日期 1982.01.09
申请号 JP19810070256 申请日期 1981.05.12
申请人 NORTON CO 发明人 MARUKOOMU II UOTSUSHIYUBAAN
分类号 C04B35/58;C04B35/591 主分类号 C04B35/58
代理机构 代理人
主权项
地址