| 摘要 |
PURPOSE:To utilize a developing solution effectively and to obtain a pattern which is excellent in dimension accuracy and reproduction property, and is used for an integrated circuit, etc., by providing a light emission part and a photodetection part so as to place a developing solution layer of positive type photoresist between them, measuring the light absorption intensity of a developing solution, and monitoring the degree of fatigue of the developing solution. CONSTITUTION:For instance, positive type photoresist is applied to a developing tank 2 from a wafer busket 4 provided on the left side, an exposed wafer 3 is carried in by a coveyor belt 10, and development is made by jetting a developing solution 1 from a nozzle 7 by use of a circulating pump 9. A light beam which has been emitted from a light emission part (11) passes through a developing solution, and goes into a photodetection part (12). In this case, an absorption spectrum is seen in a specific wavelength band due to an optical quality of a developing solution. When the intensity of this absorption spectrum is measured, a variation of an optical quality of a developing solution is monitored, by which the quantity of positive type resist which has flowed and been melted into a developing solution can be grasped. In case the melted quality of positive type resist exceeds a normal value and the developing solution is fatigued, an alarm, etc. for informing a worker that it is necessary to replace a developing solution (1) are raised by an amplification controller (13) which is interlocked with the photodetection part (12). |
