发明名称 Colloidal compositions for electroless deposition stabilized by thiourea
摘要 Metallic surfaces are imparted to non-conductors or dielectric substrates by electroless (chemical) plating process comprised of coating the substrates with colloid(s) of non-precious metals and wherein the colloids are prepared in a manner as to impart resistance towards further deterioration.
申请公布号 US4309454(A) 申请公布日期 1982.01.05
申请号 US19800137246 申请日期 1980.04.04
申请人 FELDSTEIN, NATHAN 发明人 FELDSTEIN, NATHAN
分类号 C23C18/28;H05K1/03;H05K3/18;(IPC1-7):C23C3/02 主分类号 C23C18/28
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