发明名称 VACUUM DEPOSITION METHOD
摘要 PURPOSE:To prevent the rectilinear leakage of vapor flow through a gap and enhance vacuum deposition effect by applying vacuum deposition on a substrate with a vapor source in the specific position below the gap while running the same in the slight gap between drumlike cans provided opposedly on the right and left, along the outside circumferential surfaces in the lower part of the respective cans. CONSTITUTION:When a tapelike substrate 5 is conveyed by the revolution of drum- like cans 2, 3 of deviated heights of centers O, O' in a vacuum chamber, the substrate 5 ascends along the can 2 in a gap 4 and descends along the can 3. The gap 4 is formed to such an extent that the vapor-deposited films formed on the surfaces of the substrate 5 moving mutually in opposite directions do not rub each other. Since there is the gap 4, the common tangents of both outside circumferential surfaces of the cans 2, 3 passing through this gap are A, B, and a vapor source opening part 8 is disposed in the illustrated position delineated by these and on the side outer than the shaded area below the gap 4. Diagonal incident vapor deposition is accomplished from a vapour source 7 on the moving substrate 5.
申请公布号 JPS56166372(A) 申请公布日期 1981.12.21
申请号 JP19800069970 申请日期 1980.05.26
申请人 FUJI PHOTO FILM CO LTD 发明人 SEKINE MASARU;SHIRAHATA RIYUUJI
分类号 C23C14/56;G11B5/85 主分类号 C23C14/56
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