| 摘要 |
PURPOSE:To smooth the surface of the vapor-deposited film on a substrate without degrading the properties of the film at all by treating the projecting parts of the surface of said film by pressure. CONSTITUTION:If the surface of a vapor deposition film 2 deposited under vacuum on the surface of a substrate 1 is rubbed with a soft cloth or the like, plastic deformation is easily caused in the film 2 by the pressure of friction because the film 2 is extremely porous and soft in general. Projecting parts 3 move into the inside or recessed parts of the film 2, thereby smoothing the surface of the film 2. At the time of this friction, required smoothness is sufficiently obtained by manual pressure by using a dry cloth, but if it is rubbed by a clotch attached with water and finely pulverized powder of cerium oxide or the like, the improving effect of smoothness is much higher. |
