| 摘要 |
PURPOSE:To expose a bright isolated pattern such as a contact hole with sufficient depth of focus. CONSTITUTION:A light shielding film 12 with an opening 12a is formed on a transparent, substrate 11 and a phase member 15 with conical inclination is fixed on the opening 12a in the resulting photomask. A bright region of nondiffracted beams is formed between points A1 and B1 by illumination light passing through the phase member 15. A photosensitive substrate 16 is disposed in a region A3-B3 conjugated with the projected optical system 18 of the bright region. |
