发明名称 ELECTRON GUN FOR C-CRT
摘要 The electron gun for reducing the halo phenomenon caused by the focus length difference of the electron beam includes first uni-potential type focus lenses (14-16), second uni-potential type focus lenses (17,18), and a bi-potential type focus lens (19). The constant voltage (VS) is applied to the electrodes (15,17) and the focus voltage (VF) being higher than the constant voltage is applied to the electrodes (16,18). The dynamic voltage (VD) synchronized to the deflection signal and being higher than the focus voltage is applied to the electrodes (14,19).
申请公布号 KR940010986(B1) 申请公布日期 1994.11.21
申请号 KR19920008469 申请日期 1992.05.19
申请人 SAMSUNG ELECTRON DEVICES CO., LTD. 发明人 SON, WAN - JAE;KIM, YU - SON
分类号 H01J29/50;H01J29/62;(IPC1-7):H01J29/50 主分类号 H01J29/50
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