| 摘要 |
PURPOSE:To form precisely an electrode pattern, by forming electrode films of a predetermined pattern on a light permeable insulating base plate, next, forming successively a light permeable insulator layer, an electrode coating and a photoresist film on them, and having them irradiated by light from the back surface side of the base plate. CONSTITUTION:Shift electrodes y11, y12 which are the first layer of a predetermined pattern are formed on a glass base plate. Then, thin films of a dielectric layer of Al2O3 and a metal layer 11 of Cr are formed on them so that light can be transmitted. Next, after spreading a positive type photoresist film 12, they are irradiated by ultraviolet rays from the back surface of the base plate. Then, after exposing the photoresist film 12 while applying electrodes y11, y12 as masks, and the photoresist film 12 is formed into a predetermined pattern, the metal layer 11 is formed into a predetermined pattern by means of the patterned photoresist film 12 utilized as a mask. |
