发明名称 |
PHASE ADJUSTING DEVICE OF MOIRE PATTERN |
摘要 |
PURPOSE:To facilitate the phase adjustment of a moire pattern by forming the radial lattice of an index scale with the phase of a part thereof shifted by a quarter of a pitch with respect to the radial lattice of the rest of the part. CONSTITUTION:A radial lattice 2 is formed on a main scale 1. A radial lattice 4a of a pattern the same with that of the main scale 1 is formed on a part 3a of an index scale 3, while a radial lattice 4b which is displaced by a quarter of a pitch (P) at the boundary 5 between the part 3a and the part 3b of the index scale with respect to the radial lattice formed in the part 3a and has a pitch: P+ or -P/4 is formed in the other part 3b. A moire pattern stepped along the boundary 5 is formed by the combination of the main scase 1 and the index scale 3 when the scales are illuminated by a light source 9. The phase of the moire pattern is adjusted by moving the index scale 3 so as to arrange the moire patterns parallel with each other. |
申请公布号 |
JPS56163412(A) |
申请公布日期 |
1981.12.16 |
申请号 |
JP19800068303 |
申请日期 |
1980.05.21 |
申请人 |
TOKYO SEIMITSU CO LTD |
发明人 |
EGAWA MITSURU;IWAMOTO YOUJIROU |
分类号 |
G01B11/26;G01D5/36;G01D5/38 |
主分类号 |
G01B11/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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