发明名称 Induction plasma system
摘要 An induction plasma system includes a plasma chamber, a high frequency electrical coil that surrounds the chamber, and an oscillator for energizing the coil to establish a plasma maintaining condition in the chamber. The oscillator tank circuit includes the coil, and is tuned so that it is essentially at resonance when a plasma condition is established in the chamber. Ignition means is arranged for initiating a plasma condition, and is constructed such that insertion of the ignition means into the chamber in the absence of a plasma condition shifts the impedance condition in the chamber to essentially the same tuned condition that exists when a plasma condition is established in the plasma chamber, but without need to adjust any component of the tank circuit.
申请公布号 US4306175(A) 申请公布日期 1981.12.15
申请号 US19800125999 申请日期 1980.02.29
申请人 INSTRUMENTATION LABORATORY INC. 发明人 SCHLEICHER, ROBERT G.;SMITH, JR., STANLEY B.;MCLEAN, GEORGE A.
分类号 H05H1/30;(IPC1-7):H05H1/30 主分类号 H05H1/30
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