发明名称 |
Induction plasma system |
摘要 |
An induction plasma system includes a plasma chamber, a high frequency electrical coil that surrounds the chamber, and an oscillator for energizing the coil to establish a plasma maintaining condition in the chamber. The oscillator tank circuit includes the coil, and is tuned so that it is essentially at resonance when a plasma condition is established in the chamber. Ignition means is arranged for initiating a plasma condition, and is constructed such that insertion of the ignition means into the chamber in the absence of a plasma condition shifts the impedance condition in the chamber to essentially the same tuned condition that exists when a plasma condition is established in the plasma chamber, but without need to adjust any component of the tank circuit.
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申请公布号 |
US4306175(A) |
申请公布日期 |
1981.12.15 |
申请号 |
US19800125999 |
申请日期 |
1980.02.29 |
申请人 |
INSTRUMENTATION LABORATORY INC. |
发明人 |
SCHLEICHER, ROBERT G.;SMITH, JR., STANLEY B.;MCLEAN, GEORGE A. |
分类号 |
H05H1/30;(IPC1-7):H05H1/30 |
主分类号 |
H05H1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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