| 摘要 |
PURPOSE:To eliminate conventional dummy development repeated several times in the early stage in case of a fresh developer and to easily realize a continuously developing system by dissolving a small amount of resin as the base material of a positive type photoresist in a developer for the photoresist. CONSTITUTION:When a positive type photoresist prepared by dissolving o-naphthoquinone diazide as a photosensitive substance in novolak type phenolic resin as a base material is developed with N(CH3)4OH as a developer to dissolve and remove the exposed part, 0.1-0.2g/l novolak type resin is dissolved in the developer. Conventionally, such a photoresist is developed at low speed several times in the early stage, and product wafers are lost by the dummy development. Using the resulting developer said defect is eliminated, a dropping type continuously developing system is easily realized, and development can be repeated about 100 times. |
