| 摘要 |
<p>PURPOSE:To achieve a sharp and uniform electrode by providing a recess in a crystal substrate through crystallization characteristic while employing the corresponding conical projection as one electrode layer then surrounding it through an insulation layer with facing electrode layer. CONSTITUTION:A photoresist film 12 is coated on one main face of crystsl substrate 11 such as Si crystal then a through-hole is made and a recess 13 is formed through said hole by the crystallization etching. After removing the resist film 12 a cathode electrode layer 14 is coated and an insulative reinforcing layer 15 is coated on it. The conical top 14a is exposed from below the substrate 11 through etching, then an insulation layer 16 and an electrode layer 17 are coated. Thereafter the insulation layer 16 is etched through a through-hole 17a in the conical top 14a to make a through-hole 16a below the through-hole 17a. The conical top 14a is exposed through said through-holes to form the cathode layer which is employed together with an anode electrode layer 17 through the insulation layer 16 to constitute the entire cathode. Consequently a sharp and uniform conical cathode can be produced easily and reliably.</p> |
