| 摘要 |
PURPOSE:To obtain fiber optics of an optional pattern by an easy solid-phase electric field heat diffusion and with a high controllability, by carrying out an electric field heat diffusion of a desired impurity by means of SiO2 used for a glass substrate as a mask material when 3-dimensional fiber optics is formed to an optical communication and optical IC circuit. CONSTITUTION:A pattern of a resist 2 is formed on a glass substrate 1 to form an SiO2 film 4 after a vapor deposition and a lift-off of SiO2. Then Ag3 for instance is evaporated on the entire surface as an impurity, and a contact is given between Ag3 and platinum to obtain a positive pole. At the same time, a negative pole is obtained by evaporating a silver paste or Al, and an electric field heat diffusion of Ag is given to the substrate 1 to form a light diffusing path 5. Thus the film 4 can be stuck tightly with no exfoliation and other defects. No exfoliation is caused to Ag3 since no solution is used after sticking of Ag3 to obtain a good pattern. Otherwise an SiO2 layer is first formed on the substrate 1, and then a resist pattern is formed on the SiO2 layer. Then the SiO2 layer is etched with the resist pattern used for the mask to provide an Ag layer after making the SiO2 layer into a pattern. Thereafter, an electric field heat diffusion can be carried out. |
