| 摘要 |
PURPOSE:To obtain directly electrodes and a wiring layer of the semiconductor device by a method wherein a molybdenum layer is converted into silicide selectively to form the electrodes or the wiring layer, and they are heat-treated in an oxidizing atmosphere to make the Mo to sublime and is removed. CONSTITUTION:A polycrystalline Si layer 5, the molybdenum layer 6 are laminated on a gate oxide film 2 on an Si substrate 1, and a laser beam 7 is irradiated selectively on the molybdenum layer 6 to form a pattern of molybdenum silicide 8. Because molybdenum silicide does not react with SiO2, and polycrystalline Si and Mo make molybdenum silicide at 800-1,200 deg.C, so that molybdenum can be converted easily into molybdenum silicide. Moreover the operation is to be performed in an atmosphere containing no O2. The Mo6 is sublimed converting into an oxide by heat-treating in an atmosphere containing O2 in succession, and when heat treatment is continued to oxidize the polycrystalline Si layer 5 completely, the desired gate electrode pattern 81 of molybdenum silicide and an insulating film 21 can be obtained, and the film 21 can be utilized for interlayer insulation. By this constitution, contamination by a photosensing material is not generated, and the removal of needless Mo and the formation of interlayer insulating film can be performed at the same time. |
