| 摘要 |
<p>PURPOSE:To eliminate the roundness of the top angle of a slit, by making the top angle of a slit hole mask nega pattern to be acute. CONSTITUTION:The top angle of a rectangular slit hole mask pattern 21 for obtaining a slit type shadow mask hole is made to be acute. A slit hole mask nega pattern where such pattern is arranged as required is used to print a slit hole latent image on a photo-sensitive film. Consequently a slit hole where there is no roundness in the top angle can be formed through the etching resulting in the improvement of the brightness of the picture image.</p> |
