发明名称 PLASMA APPARATUS
摘要 PURPOSE:To unify a formation film thickness by a parallel flat plates electrode type apparatus by a method wherein a container provided with a feed water pipe and a drain pipe on the reverse side of the electrode, and a permanent magnet unit is housed supported by a water wheel in the container and rotated by a cooling water flow. CONSTITUTION:In, for example, a spattering device provided with the electrodes in parallel flat plate-type, the permanent magnet unit 6 comprising the permanent magnets 6a, 6b and the magnetic flat plate 6c is disposed on the reverse side of a cathode 3 so as to form a magnetic field between the electrodes. The magnet unit 6 is housed in the cooling water container 12 fitted with the feed pipe 7 and the drain pipe 8 without being directly fitted to the cathode, and the container 12 is disposed on the reverse side of the cathode 3. The magnet unit 6 is supported by the water wheel 9 fitted inside the coaxial feed and drain pipes, through a bearing 11, and rotated integratedly with the water wheel 9 by the flow of the cooling water. Thereby, the magnetic field can be unified and accordingly, the formation film thickness or an etching work can be made uniform.
申请公布号 JPS56155533(A) 申请公布日期 1981.12.01
申请号 JP19800057890 申请日期 1980.05.02
申请人 TOHOKU METAL IND LTD 发明人 YONEYAMA HIROSHI;YAMASHITA TSUTOMU;WATANABE HIDEO
分类号 H01L21/302;H01J37/34;H01L21/3065;(IPC1-7):01L21/302 主分类号 H01L21/302
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