发明名称 PHOTOCURABLE RESIN LIQUID COMPOSITION
摘要 PURPOSE:A composition which can form a uniform resin liquid without use of water, can be easily developed, has excellent adhesion to glass and is useful for printing plates, stained glass, etc., comprising polyvinyl pyrrolidone, phenyl glycidyl ether acrylate, an acrylic acid type monomer contg. active hydrogen and a photoinitiator. CONSTITUTION:A photocurable resin composition consisting mainly of (A) 1- 20wt% polyvinyl pyrrolidone, (B) 20-70wt% phenyl glycidyl ether acrylate, (C) 10-79wt% acrylic acid type monomer contg. active hydrogen, e.g., 2-hydroxyethyl methacrylate, and (D) a photoinitiator, e.g., benzoin isobutyl ether. This composition can form a uniform resin liquid without use of water; after exposure to light, can be easily developed by simple water washing; provides high image definition and excellent adhesion to glass; and is useful for printing plates, photosensitive paints and stained glass.
申请公布号 JPS56152803(A) 申请公布日期 1981.11.26
申请号 JP19800056600 申请日期 1980.04.28
申请人 NIPPON SYNTHETIC CHEM IND 发明人 NAKAMURA SUSUMU;AOYANAGI YOSHIOMI
分类号 C08F2/00;C08F2/44;C08F2/48;C08F20/00;C08F20/10;C08F20/26;C08F26/10;C08F220/28;C08F220/30;C08F226/10;H01L21/027;H01L21/302 主分类号 C08F2/00
代理机构 代理人
主权项
地址