| 摘要 |
PURPOSE:To exhaust and remove minute particles, etc. produced during putting in and out of a board by providing a suction port intercommunicating with the exhaust system of the outside to the bottom surface of the board of a chemical vapor deposition device using decreased pressure. CONSTITUTION:Suction ports 3a are formed to the bottom surface of the board 3 of a decompression type chemical vapor phase device and further these ports 3a are connected to the exhaust system of the outside by a piping 9. If negative pressure is applied to the suction ports 3a through the piping 9 at the time of putting the board 3 into or out from the inside of a reaction tube 1, the minute particles and the like of the product 8 of reaction breed on the inside wall of the tube 1 are exhausted and removed to the outside through the ports 3a. Hence, the inside of the tube is maintained clean and the formed film of good quality are formed. |
