| 摘要 |
<p>The double gun electron beam microscope equipment is used for accurate registration direct fabrication and mask making using a beam pattern method on a semiconductor slice. The beam from the first gun (1) is focussed by corpuscular optic electromagnetic lenses (5,7,9,11) onto the semiconductor item (14) held in an adjustment device (35). A second gun (26) beam is directed through a beam deviation device (24) and focussed on the under-side of the work (14) by a second corpuscular optic lens arrangement arrangement (15,20,23). Picture receiver (25) and beam detection apparatus (34) is also incorporated. The picture receiver (25) and beam deviator (24) can be used to receive the pattern produced by the beam from the first gun (1). The second gun's (26) beam is displayed as a raster by deflection coils (16) in the fast corpuscular lens (15) under the work (14).</p> |
