发明名称 PATTERN FORMING METHOD
摘要 PURPOSE:To obtain a high quality pattern of a metal or inorg. matter having satisfactory adhesion to a substrate with superior productivity without using a compd. causing environmental pollution by forming an electrically conductive film on the substrate before plating or vapor deposition. CONSTITUTION:An electrically conductive film 2 of copper, silver or the like is formed on the surface of plastic substrate 1 by sputtering or other method and a required mask pattern 3 of thermosetting resin or the like is formed on the surface of the film 2 by screen printing or other method. A thin film pattern 4 of a metal or inorg. matter is then formed by electroplating, electroless plating or vapor deposition, the mask pattern 3 is removed and the electrically conductive film 2 is etched to a prescribed pattern. Thus, the desired pattern 5 can be obtd.
申请公布号 JPS63282280(A) 申请公布日期 1988.11.18
申请号 JP19870119537 申请日期 1987.05.15
申请人 TOOBI:KK;AOKI TSUKASA 发明人 NOMACHI TETSUYA;AOKI TSUKASA
分类号 C23C18/16;C23C18/20;C23C18/31;C23C18/34;C23C18/40;C23C30/00;C23F1/00;C25D5/02;H05K3/06;H05K3/10 主分类号 C23C18/16
代理机构 代理人
主权项
地址
您可能感兴趣的专利