| 摘要 |
PURPOSE:To enable to obtain an uniform crystallinity of wafers irrelevant to the position of the boat by a method wherein plural disks are provided at both ends in the longitudinal direction of the boat for heat treatment of the wafers. CONSTITUTION:The wafers are arranged being made to stand on the part 6 of the boat 7, the quartz disks 9, 9' having nearly the same diameter with the wafers are provided plural by plural at the both ends of the boat 7, and the boat 7 is inserted in a heat treatment oven 8. By providing the disks 9, 9' at the both ends of the boat 7 like this, the speed of radiation and absorption of heat of the wafers located on the neighborhood of the both ends of the boat 7 is mitigated, and accordingly the generation of crystal defect like slip, etc., can be suppressed. |
