| 摘要 |
PURPOSE:To contrive to improve the characteristic of the semiconductor device by a method wherein a demineralized water being specified free chlorine dissolved therein a used as a cleaning water, and washing is performed. CONSTITUTION:When the semiconductor device is to be washed, the device is washed with the demineralized water being free chlorine less than 0.1ppm dissolved therein. Accordingly the growth of bacteria in the cleaning water is suppressed, and even if heavy metal is adhered to the water, it is combined favorably with the dissolved chlorine and is removed, and the characteristic of the semiconductor device can be improved much more. |
