| 摘要 |
PURPOSE:To eliminate the installation for heating a substrate when the spattering is carried out by heating a film of an alloy which is spattered onto the substrate in an inert gas containing oxygen. CONSTITUTION:For example, a target 4 comprising an alloy of Cd and Sn is fixed on a cathode 3. Subsequently, a substrate plate 8 of a transparent conductive film is fixed to a lower surface of an anode 2 and a pressure of a mixed gas of an oxygen gas and an inert gas (an argon gas) in a container 1 is maintained to about 3-10<-2> Torr. Next, D.C. voltage (2KV) is applied between the anode 2 and the cathode 3 and discharged and, when a shutter is opened, a film 9 is accumulated on the substrate plate 8. Said film 9 is taken out and, for example, heated to 300 deg.C for about 60min in the air. Subsequently, said head treatment is repeatedly carried out at about 400 deg.C for about 30min and a film with excellent physical properties is obtained. |
