| 摘要 |
PURPOSE:To enable alignment with high accuracy by detecting the difference between a distance between two alignment marks on the mask side and a distance between two alignment marks on the transferred substrate side corresponding to these marks and expanding and contracting a mask in response to the difference. CONSTITUTION:The state of conformation of a substrate-side alignment mark M1 and a mask-side alignment mark M2 is position-detected by a mark position transducer 9. The detecting signal is processed by an arithmetic unit 11 and the quantity of positional displacement is computed, and a stage 3 is moved to a desired value by a stepping motor 4 while being read by a length measuring machine 5. The difference between the pattern size of a mask and a substrate is computed by the arithmetic unit 11 by detecting signals from two mark position transducers 9 receiving information from each two substrate-side alignment marks M1 arranged at equal distances and two mask-side alignment marks M2 corresponding to these alignment marks M1. When it is considered that the pattern is expanded and contracted equally, the pattern is represented as the difference between a distance between two M1 and a distance between two M2, and the quantity of the warpage is transmitted over a warpage generator 6 for the mask. Accordingly, alignment is enabled with high accuracy. |
