| 摘要 |
PURPOSE:To develop a superfine pattern in excellent reproducibility by mounting a plural stage of treating sections with the first means, which adsorb semiconductor wafers by vacuum and turn them, and the second means consisting of treating- liquid dropping means and treating-liquid injection means. CONSTITUTION:A spin chuck 6, which adsorbs a semiconductor wafer 5 by vacuum and turns it, and the second treating section consisting of the same constitution as the first treating section being composed of a treating-liquid injection nozzle 7 and a treating-liquid dropping nozzle 8 are installed through a transfer section 16, and the semiconductor wafer is successively treated using the first treating section as a developing section and the second treating section as a rinsing section. Thus, a superfine pattern can be obtained in excellent reproducibility because the wafer is coated with a new treating liquid at all times and uniformly developed stably. |
