发明名称 RADIATIONSENSITIVE COPYING COMPOSITION
摘要 <p>This invention relates to a radiation-sensitive copying composition which comprises (a) a compound which forms an acid under the influence of actinic radiation, and (b) an organic polymeric compound which contains recurrent acetal or ketal groupings in its main chain and whose solubility in a liquid developer is increased by the action of an acid, each alpha -carbon atom of the alcoholic constituent of the acetal or ketal grouping of the organic polymeric compound being aliphatic. The invention also relates to a process for the production of relief images using a radiation-sensitive copying composition.</p>
申请公布号 GB1602902(A) 申请公布日期 1981.11.18
申请号 GB19780016074 申请日期 1978.04.24
申请人 HOECHST AG 发明人
分类号 H05K3/00;B41M5/26;G03C1/72;G03F7/004;G03F7/021;G03F7/022;G03F7/039;G03H1/00;H01L21/027;(IPC1-7):08G4/00;03C1/72;03C1/52 主分类号 H05K3/00
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