发明名称 |
Alignment device |
摘要 |
An alignment device of a type, wherein an alignment pattern provided on a mask for fabrication of a semiconductor circuit element and an alignment pattern provided on a wafer are photoelectrically read in a dark field by a flying spot scanning system or a flying image scanning system to detect a relative positional relationship between the mask and the wafer, and a desired positional relationship is obtained by moving at least one of the mask and wafer on the basis of a detected signal. The novel feature of this alignment device resides in that the size of a line forming the alignment pattern along the scanning line is twice or more as large as the size of the scanning spot.
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申请公布号 |
US4301363(A) |
申请公布日期 |
1981.11.17 |
申请号 |
US19790070986 |
申请日期 |
1979.08.30 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUZUKI, AKIYOSHI;HIRAGA, RYOZO;YOSHINARI, HIDEKI |
分类号 |
G02B7/00;B23Q15/24;G03F9/00;H01L21/027;(IPC1-7):G01N21/86 |
主分类号 |
G02B7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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