APPARATUS, SYSTEM AND METHOD FOR OPTICALLY ANALYZING SUBSTRATE

摘要

An apparatus for optically analyzing a substrate. The apparatus includes: (a) a light source for directing light onto the substrate; (b) optics for creating an optical path from light reflected from the substrate; and (c) a multiple wavelength imaging optical subsystem positioned in the optical path. The multiple wavelength imaging optical subsystem includes: (i) one or more filters which are capable of one or both of: (1) being alternatively or sequentially interposed in the optical path to extract one or more of wavelengths or wavelength bands of interest; or (2) having their wavelength selectivity adjusted to extract one or more wavelengths or wavelength bands of interest; and (ii) one or more imaging devices positioned to image the extracted wavelengths or wavelength bands of interest from the one or more filters; (d) an imaging device positioned in the optical path. Also a method with the apparatus.