Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same

摘要

An apparatus for determining positions of a plurality of regions formed on a substrate based on positions of a plurality of sample regions sampled from the plurality of regions. The apparatus includes a processor configured to control operation of a stage and an alignment optical system so as to obtain positions of the plurality of the sample regions sampled from the plurality of regions, to calculate a first conversion parameter and a second conversion parameter for converting designed positions of the plurality of regions into first and second determined positions of the plurality of regions based on at least designed positions of the plurality of the sample regions and positions of the plurality of the sample regions measured by the alignment optical system, and to determine whether to finish the position determinations based on a difference between the first conversion parameter and the second conversion parameter.