发明名称 MATERIAL FOR LITHOGRAPHIC PLATE
摘要 PURPOSE:To obtain a material for a lithographic plate having superior resolution and printing resistance by forming a photoconductive layer cntg. an alkali-soluble polymer contg. COOH, condensed polycyclic quinone pigment and an oxadiaoazole deriv. on a hydrophilic substrate. CONSTITUTION:A polymerizing unsatd. monomer such as acrylic acid and other polymerizing monomers, e.g., acrylic acid, methyl methacrylate and butyl acrylate are copolymerized in 25:45:30 ratio of polymerization to prepare a polymer having strength, heat resistance and lipophilic properties. A coating liq. contg. 30-5pts.wt. condensed polycyclic quinone pigment and a 10-40pts.wt. oxadiazole deriv. to 100pts.wt. the polymer is applied to the hydrophilic surface of an Al plate or the like and cured by heating to manufacture a plate for a lithographic plate. This sensitive plate is charged, imagewise exposed, fixed by heating, and washed out with an aqueous soln. contg. sodium silicate and alcohols to obtain a lithographic plate having superior resolution, printing resistance, solvent resistance etc.
申请公布号 JPS56146145(A) 申请公布日期 1981.11.13
申请号 JP19800048678 申请日期 1980.04.15
申请人 DAINIPPON INK & CHEMICALS;DAINIPPON INK RIKAGAKU KENKUYS 发明人 KINOSHITA AKIO;OUMI TAKAYUKI;SUMINAGA TAKESHI;TAKENOUCHI OSAMU;TOYOSHIMA TOMOYOSHI;KANNA KENJI
分类号 G03G13/28;G03G13/26;(IPC1-7):03G13/26 主分类号 G03G13/28
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