| 摘要 |
PURPOSE:To make it possible to illuminate the surface of a mask by the luminous flux having the desired shape only by changing the shape of the opened part of a slit plate, and to obtain an effective illumination for various kinds of semiconductor chips by a method wherein a slit plate is provided between the light source of a lighting system and the mask, and said slip plate is arranged at a position which is optically comjugated with the surface of the mask. CONSTITUTION:The number 15 in the diagram is an extra-high pressure mercury lamp, Ro is a spherical reflecting mirror, and R1 is a telecentric band-like spherical mirror. A circular light source image is formed on the surface of a slit plate S1. The radial direction of the circular light source image on the mask surface and the length of the circular direction can be adjusted by changing the length of radial direction of the aperture on the slit S1 and the length of the circular direction. A printing device is arranged in such a manner that the centers of curvature of a concave mirror 17 and a convex mirror 18 will be coincided with each other in the reflection optical system having the unit magnification on the part shown by 16, light path is bent by plane mirrors 9 and 20, and the mask surface MK and the wafer surface WF are brought into a 1 to 1 image-formation relation. |
