发明名称 |
METHOD OF RECYCLING DUMMY WAFER |
摘要 |
A method of recycling dummy wafer is provided. The dummy wafer has at least one low-k dielectric material layer formed thereon. A treatment process is performed to the low-k dielectric material layer on the dummy wafer so that a component or impurity in the low-k dielectric material layer reacts to form a volatile substance. A wet etching process is performed to remove the low-k dielectric material layer.
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申请公布号 |
US2008067145(A1) |
申请公布日期 |
2008.03.20 |
申请号 |
US20060532088 |
申请日期 |
2006.09.14 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
WANG CHIH-CHUN;LEE CHIA-PIN;WU CHUN-YUAN;TENG HSIEN-CHE;CHEN HSIN-HSING;LIN YU-CHENG |
分类号 |
C03C15/00;C03C25/68 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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