发明名称 METHOD OF RECYCLING DUMMY WAFER
摘要 A method of recycling dummy wafer is provided. The dummy wafer has at least one low-k dielectric material layer formed thereon. A treatment process is performed to the low-k dielectric material layer on the dummy wafer so that a component or impurity in the low-k dielectric material layer reacts to form a volatile substance. A wet etching process is performed to remove the low-k dielectric material layer.
申请公布号 US2008067145(A1) 申请公布日期 2008.03.20
申请号 US20060532088 申请日期 2006.09.14
申请人 UNITED MICROELECTRONICS CORP. 发明人 WANG CHIH-CHUN;LEE CHIA-PIN;WU CHUN-YUAN;TENG HSIEN-CHE;CHEN HSIN-HSING;LIN YU-CHENG
分类号 C03C15/00;C03C25/68 主分类号 C03C15/00
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