Process for producing a patterned resist image.

摘要

The invention relates to a process for producing a patterned resist image in a layer of a phenol-formaldehyde/diazoketone resist material.
<??>The exposed patterns in the resist layer are developed in an oxygen plasma by treating the resist layers, prior to development, with a magnesium salt. This produces a negative pattern. Positive patterns are produced by combining the process with decarboxylation of the exposed areas followed by blanket exposure.