| 摘要 |
PURPOSE:To obtain a pattern of high accuracy by applying a soln. contg. a curable epoxy compound and a compound contg. a quinonediazido group to a substrate, drying the soln., imagewise exposing the resulting photosensitive material, heating it, and removing the exposed part by dissolution. CONSTITUTION:A soln. contg. a compound contg. a quinonediazido group such as benzoquinonediazido or naphthoquinonediazide by 10-40pts.wt. to 100pts.wt. of a curable epoxy compound such as bisphenol-A type epoxy resin or a glycidyl group- contg. monomer or (co)polymer is applied to a substrate of a metal such as Al or Cu or a silicon wafer and dried to form a photosensitive material. This material is imagewise exposed and uniformly heated to 110-220 deg.C to cure the unexposed part. The exposed part is then removed with a developer such a ethylene glycol monobutyl ether to obtain an image of high accuracy used in the manufacture of various electronic materials. |
