COATING LIQUID FOR GATE INSULATING FILM, GATE INSULATING FILM AND ORGANIC TRANSISTOR

摘要

Disclosed is a coating liquid for gate insulating films which can be fired at a low temperature not more than 180°C. Also disclosed is a gate insulating film which can be easily formed by coating and has excellent solvent resistance and good characteristics such as resistivity and semiconductor mobility when an entire device is produced only by coating. Further disclosed is an organic transistor using such a gate insulating film. Specifically disclosed is a coating liquid for gate insulating films which is characterized by containing a polyimide obtained by dehydration ring closing of a polyamide acid having a repeating unit of a specific structure. Also specifically disclosed are a gate insulating film using the coating liquid and an organic transistor using such a gate insulating film.