STAIN REMOVING LIQUID OF ARTICLE SURFACE,申请号JP19800044370-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	STAIN REMOVING LIQUID OF ARTICLE SURFACE
摘要
申请公布号	JPS56139598(A)	申请公布日期	1981.10.31
申请号	JP19800044370	申请日期	1980.04.02
申请人	MOON STAR CHEMICAL CORP	发明人	MINAMI HARUICHI
分类号	C11D7/50;B43L19/00;C09D5/00;C11D7/22	主分类号	C11D7/50
代理机构		代理人
主权项
地址

您可能感兴趣的专利

ELECTRONIC CIRCUIT

SEMICONDUCTOR DEVICE

SEMICONDUCTOR PACKAGE

SUBSTRATES AND INTEGRATED CIRCUIT CHIP WITH IMPROVED PATTERN

CHIP USING TRIPLE PAD CONFIGURATION AND PACKAGING METHOD THEREOF

ULTRATHIN SUPERLATTICE OF MnO/Mn/MnN AND OTHER METAL OXIDE/METAL/METAL NITRIDE LINERS AND CAPS FOR COPPER LOW DIELECTRIC CONSTANT INTERCONNECTS

IO POWER BUS MESH STRUCTURE DESIGN

Capacitors with Barrier Dielectric Layers, and Methods of Formation Thereof

OFFSET INTERPOSERS FOR LARGE-BOTTOM PACKAGES AND LARGE-DIE PACKAGE-ON-PACKAGE STRUCTURES

METHOD OF MAKING A SEMICONDUCTOR DEVICE PACKAGE

MOLD PACKAGE AND MANUFACTURING METHOD THEREOF

SILICON PACKAGE HAVING ELECTRICAL FUNCTIONALITY BY EMBEDDED PASSIVE COMPONENTS

SILICON PACKAGE FOR EMBEDDED SEMICONDUCTOR CHIP AND POWER CONVERTER

METHODS FOR FABRICATING INTEGRATED CIRCUITS WITH IMPROVED ACTIVE REGIONS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR WAFER PROTECTIVE FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METAL HALIDE SOLID-STATE SURFACE TREATMENT FOR NANOCRYSTAL MATERIALS

SYSTEM FOR MANUFACTURING GRAPHENE ON A SUBSTRATE

Atomic Layer Deposition Of Films Comprising Si(C)N Using Hydrazine, Azide And/Or Silyl Amine Derivatives

MULTI-DOPANT PERMEATION TUBE