LDD spacer forming method of semiconductor device,申请号KR20020040383-传众专利搜索

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发明名称	LDD spacer forming method of semiconductor device
摘要
申请公布号	KR100895822(B1)	申请公布日期	2009.05.08
申请号	KR20020040383	申请日期	2002.07.11
申请人		发明人
分类号	H01L29/78;(IPC1-7):H01L29/78	主分类号	H01L29/78
代理机构		代理人
主权项
地址

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