发明名称 ALLOY TARGET FOR THIN FILM MANUFACTURE
摘要 PURPOSE:To obtain the titled alloy target causing no cracks after casting and working, having high oxidation resistance, and requiring no presputtering as a sputtering target, by providing a composition consisting of Co, etc., Pt and/or Pd, and rare-earth elements and also by specifying respective contents of Pt and Pd. CONSTITUTION:An alloy is prepared so that it has a composition which consists of both of Fe and Co, or Co and either or both of Pt and Pd, and one or more kinds among rare-earth elements and in which Pt and/or Pd content is regulated to >=20atom.%. Moreover, it is desirable to use rare-earth elements other than Tb or Gd and Tb. A thin amorphous-alloy film obtained by using the above alloy target has superior magneto-optical characteristics, such as high coercive force invariable with the lapse of time, and further high reflectivity.
申请公布号 JPS63297553(A) 申请公布日期 1988.12.05
申请号 JP19870131265 申请日期 1987.05.29
申请人 MITSUI PETROCHEM IND LTD 发明人 HARUTA KOICHI;MIZUMOTO KUNIHIKO;KAJIURA HIROICHI
分类号 C23C14/34;G11B11/10;G11B11/105;H01F41/18 主分类号 C23C14/34
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