| 发明名称 |
LITHOGRAPHY |
| 摘要 |
A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements which are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area. |
| 申请公布号 |
JPS63304257(A) |
申请公布日期 |
1988.12.12 |
| 申请号 |
JP19880095824 |
申请日期 |
1988.04.20 |
| 申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
BAAN JIENGU RIN;AN MARII MORUZUI;AREN EDOWAADO ROOZENBURATSUSHIYU |
| 分类号 |
G03F1/00;G03F7/20;H01L21/027 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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