| 摘要 |
PURPOSE:To prevent cracking and disconnection in a wiring conductive film by making the surrounding wall of a contact hole like a staircase. CONSTITUTION:An insulator film 3 is formed on the surface of an n type substrate 1 provided with a p type diffused film 2. Then, with a resist mask 5, the insulator film 3 on an n type region is selectively etched to form a concave section 8 at a depth 1/2 of the film thickness for instance. After removal of the resist 5, a resist mask 9 is formed with a surrounding wall for a window 4a inside the surrounding wall of the concave section 8 and the insulator film 3 is etched to form a contact hole 11. After the removal of the resist 7, a wiring conductive film 12 is formed and connected to the surface of the p type diffused layer 2. In this contact hole 11, the step on the surrounding wall represents a staircase at a height almost 1/2 of the thickness of the insulator film 3, preventing cracking and disconnection in the wiring conductive film 12. |
