发明名称 ELECTRONIC BEAM EXPOSING APPARATUS
摘要 PURPOSE:To prevent a drift of an image on the surface of a material varying cyclically in a fine adjustment such as optical axis alignment by automatic cyclic change of focal distance in the lens system. CONSTITUTION:The adjustment of an object lens 7, an eccentric lens 10 and electron beam generation systems 1-3 has been completed. An axis alignment is made by roughly adjusting the position of a condenser lens 5 and exciting current is supplied 8 to the object lens 7 to form an electron beam image, which is observed on a CRT14. Then, a cyclically exciting current overlaps the object lens by a circuit 9. Deviation, if any, in the axis of the lens 5 causes a cyclical change in the alignment of the image on the CRT14 with the focal point producing a blur and a cyclical drift vertically and horizontally. A fine axis alignment to minimize the drift is made by moving the position of the lens 5 and then, the exciting current of the object lens 7 is reduced to zero to form an image by a power source 8. Thus, the required time can be reduced for the fine adjustment of the optical axis.
申请公布号 JPS56134734(A) 申请公布日期 1981.10.21
申请号 JP19800037986 申请日期 1980.03.25
申请人 CHO LSI GIJUTSU KENKYU KUMIAI 发明人 SUZUKI KATSUMI
分类号 H01J37/21;H01J37/304;H01L21/027 主分类号 H01J37/21
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