| 摘要 |
PURPOSE:To sharply shorten the time needed for exposure by determining the amount and direction of stage movement and the width and direction of electron beam deflection, by twice stage movements. CONSTITUTION:The stage 8 is moved twice so that the mark on the first field of a chip on a wafer W is positioned at the right-lower side and the left-upper side of the deflection field, and the amount of stage movement and the coordinates attained by beam scanning of the mark are measured by an arithmetic circuit (inside CPU5). The conversion coefficient between the stage system and the field system is calculated from the results of measurement by this circuit. And also, the amount of stage movement in X and Y direction is calculated from coordinates of other marks in this field. Also, the width and direction of electron beam deflection are calculated. From results of these calculations, required pattern is drawn in the first field controlled by orders from CPU5. Hereon, drawings are made in the same way. |
