| 摘要 |
PURPOSE:To form the gap of magnetic head having comparatively greater gap length with good accuracy, by commonly using the film coating method like photoetching method, CVD method and sputtering method. CONSTITUTION:After mirror-polishing the surface of a pair of ferrite wafers 1, 2 the gap length regulating groove 3 having the depth with less value slightly than the gap length is machined with the photoetching method, to the part being the gap. The nonmagnetic substance film is adhered to the surface of the wafer 1 not processed for the groove and of the wafer 2 processed for the groove 3, so that the value of addition of the film thickness of both the wafers is a value of the gap length subtracted from the depth of the gap length regulation groove 3. The attachment of the nonmagnetic film is made by CVD method and sputtering method. After attaching the nonmagnetic substance film, the track width regulating groove 5, winding groove 6 and coupling member filling groove 7 are processed orthogonal to the groove 3. Further, after butting both the wafers 1, 2 and melting the glass, the head chip can be constituted by slicing and polishment with chamfering. |
