| 摘要 |
Photolithographic methods for the production for example of microelectronic circuits and sensitizing and printing elements in offset printing forms show marked improvement in sensitivity, non-critical outline development and good shelf-life as well as high resolving power and good adhesion of photosensitive coatings to a carrier base while remaining sensitive to exposure from a wide variety of radiation sources, by incorporating in or on a chalcogenide photosensitive layer, one or more materials selected from dyestuffs having the capacity for dyeing tannined cotton, dyestuffs having the capacity for dyeing synthetic fibres, compounds capable of acting as accelerators, antioxidants or age resistors in the vulcanization of elastomers and developing agents effective in the development of silver halide-based photographic materials. Many of the aforesaid advantages are also achieved if the dyestuff(s) is incorporated in an alkaline developing agent of the usual type. |
