发明名称 Chromium plating stacked piston rings - using plant with main and auxiliary anodes in defined geometry relative to cathode system
摘要 <p>The workpieces are assembled in a stack forming a cathode, which is surrounded by a main anode; and auxiliary anodes are located between the cathode and the main anode. The distance between the cathode and the main anode is at least twice, and pref four times, the distance from the cathode to the auxiliary anodes. The surfaces of the auxiliary anodes are pref 30-70% smaller than the surfaces of the workpieces; and the auxiliary anodes can pref be adjusted vertically in the plating tank. A deposit with uniform thickness can be obtd on all the workpieces, so mfg costs are reduced. Due to the uniform thickness, subsequent grinding or lapping operations are also reduced to a min.</p>
申请公布号 DE3012490(A1) 申请公布日期 1981.10.08
申请号 DE19803012490 申请日期 1980.03.31
申请人 GOETZE AG 发明人 MATZNER,GUENTER
分类号 C25D7/04;(IPC1-7):25D7/04 主分类号 C25D7/04
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